Hydrothermal BaTiO3 thin films on Ti-covered silicon: Characterization and growth mechanism

Journal of the Electrochemical Society

Volumn 143, Issue 3, 1996, Pages 1133-1137

  Xu, W ^a   Zheng, L ^a   Xin, H ^a   Lin, C ^a   Okuyama, Masanori ^b  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BARIUM TITANATE; CHARACTERIZATION; CRYSTAL GROWTH; ELECTRIC CONDUCTIVITY; FILM PREPARATION; POLYCRYSTALLINE MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON; TITANIUM; X RAY DIFFRACTION;

CROSS SECTIONAL TRANSMISSION MICROSCOPY; HYDROTHERMAL METHOD; SPREAD RESISTANCE PROBING;

THIN FILMS;

EID: 0030106682     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836596     Document Type: Article

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