Electron beam assisted chemical etching of single crystal diamond chips (1st report) - Etching characteristics and fabrication of line and rectangular pattern

Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering

Volumn 62, Issue 3, 1996, Pages 448-452

  Taniguchi, Jun ^a   Miyamoto, Iwao ^a  

^a NONE

Author keywords

Diamond tool; Electron beam assisted chemical etching; Oxygen gas; Scanning electron microscope

Indexed keywords

ELECTRON BEAMS; GAS ADSORPTION; MACHINE TOOLS; MODELS; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; SURFACES; SYNTHETIC DIAMONDS;

DIAMOND TOOLS; ELECTRON BEAM ASSISTED CHEMICAL ETCHING; LINE AND RECTANGULAR PATTERNS; OXYGEN GAS;

ETCHING;

EID: 0030106617     PISSN: 09120289     EISSN: None     Source Type: Journal    
DOI: 10.2493/jjspe.62.448     Document Type: Article

References (6)

1. . with a Low Energy Ion Beam, Nuclear Instruments and Methods in Phys. Res., B39, (1989) 696.
2. S. Kiyohara and I. Miyamoto : Ultra-precision Processing of Diamond with Oxygen Ion Beams, Adv. Intelligent Prod., The Japan Soc. Prec. Eng., (1994) 576.
3. H. Fernandez-Moran: Megavolt and Cryo Electron Microscopy of Diamond Knife Edges, Ultramicroscopy, 20, (1986) 317.
4. S. Matsui, T. Ichihashi, M. Baba and A. Satoh : Elecrton Beam Induced Selective Etching and Deposition Technology, Superlattices and Microstructures, 7, 4, (1990) 295.