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Volumn 108, Issue 4, 1996, Pages 399-402
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Channeling studies of relaxed, epitaxial Si1 - XGex films
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPOSITION;
CRYSTAL ATOMIC STRUCTURE;
DISLOCATIONS (CRYSTALS);
EPITAXIAL GROWTH;
FILMS;
GERMANIUM;
MOLECULAR BEAM EPITAXY;
PHOTOLUMINESCENCE;
RELAXATION PROCESSES;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SUBSTRATES;
TRANSMISSION ELECTRON MICROSCOPY;
COMPOSITIONAL GRADING TECHNIQUE;
GRADED BUFFER LAYER;
SILICON GERMANIDE;
SEMICONDUCTING SILICON COMPOUNDS;
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EID: 0030106553
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/0168-583X(95)01262-1 Document Type: Article |
Times cited : (7)
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References (11)
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