Electrical characteristics of chemical vapor deposited diamond films

Physica Status Solidi (A) Applied Research

Volumn 154, Issue 1, 1996, Pages 371-384

  Sugino, T ^a   Shirafuji, J ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARSENIC; CHEMICAL VAPOR DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CONDUCTIVITY; GRANULAR MATERIALS; HYDROGEN; HYDROGENATION; OXYGEN; POLYCRYSTALLINE MATERIALS; SEMICONDUCTOR PLASMAS; X RAY PHOTOELECTRON SPECTROSCOPY;

FREQUENCY DEPENDENT CONDUCTANCE MEASUREMENT; HYDROGEN PLASMAS; KELVIN PROBE METHOD; OHMIC CONDUCTION; SURFACE BAND BENDING;

DIAMOND FILMS;

EID: 0030106389     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.2211540126     Document Type: Article

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