All laser-assisted heteroepitaxial growth of Si0.8Ge0.2 on Si(100): Pulsed laser deposition and laser induced melting solidification

Applied Physics Letters

Volumn 68, Issue 13, 1996, Pages 1781-1783

  Serna, R ^a   Blasco, A ^a   Missana, T ^a   Solis J ^a   Afonso, C N ^a   Rodriguez A ^b   Rodriguez T ^b   Da Silva, M F ^c  

^a INSTITUTO DE ÓPTICA   (Spain)

^b UNIVERSIDAD POLITÉCNICA DE MADRID   (Spain)

^c INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; DEPOSITION; DIFFUSION IN SOLIDS; EPITAXIAL GROWTH; HELIUM NEON LASERS; INTERFEROMETRY; MELTING; PULSED LASER APPLICATIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON; SOLIDIFICATION;

CHANNELING SPECTRA; PULSED LASER DEPOSITION; REFLECTANCE INTERFEROMETRY; REFLECTIVITY; SILICON GERMANIDE;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0030104914     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116665     Document Type: Article

References (23)

1. J. R. Abelson, T. W. Sigmon, K. B. Kim, and K. H. Weiner, Appl. Phys. Lett. 52, 230 (1988).
2. Y. Chang, S. Y. Chou, K. -J. Kramer, T. W. Sigmon, A. F. Marshall, and K. H. Weiner, Appl. Phys. Lett. 58, 2150 (1991).
3. K. -J. Kramer, S. Talwar, T. W. Sigmon, and K. H. Weiner, Appl. Phys. Lett. 61, 769 (1992).
4. S. Lombardo, K. Kramer, M. O. Thompson, and D. R. Smith, Appl. Phys. Lett. 59, 3455 (1991).
5. S. Lombardo, P. M. Smith, M. J. Uttormark, D. P. Brunco, K. Kramer, and M. O. Thompson, Appl. Phys. Lett. 58, 1768 (1991).
6. See, for example, Pulsed Laser Deposition of Thin Films, edited by D. B. Chrisey and G. K. Hubler (Wiley, New York, 1994).
7. F. Antoni, E. Fogarassy, C. Fuchs, B. Prévot, and J. P. Stoquert, Appl. Surf. Sci. 86, 175 (1995).
8. F. Antoni, E. Fogarassy, C. Fuchs, J. J. Grob, B. Prévot, and J. P. Stoquert, Appl. Phys. Lett. 67, 2072 (1995).
9. C. N. Afonso, R. Serna, F. Catalina, and D. Bermejo, Appl. Surf. Sci. 46, 249 (1990).
10. J. A. Greer, in Pulsed Laser Deposition of Thin Films, edited by D. B. Chrisey and G. K. Hubler (Wiley, New York, 1994), pp. 293-311.
11. F. Vega, C. N. Afonso, C. Ortega, and J. Siejka, J. Appl. Phys. 74, 963 (1993).
12. J. Solís, F. Vega, and C. N. Afonso, Appl. Phys. A (to be published).
13. J. Solis, and C. N. Afonso, J. Appl. Phys. 69, 2105 (1991).
14. G. E. Jellison, Jr., D. H. Lowndes, D. N. Masshburn, and R. F. Wood, Phys. Rev. B 34, 2407 (1986).
15. F. Vega, R. Serna, C. N. Afonso, D. Bermejo, and G. Tejada, J. Appl. Phys. 75, 7287 (1994).
16. J. Solís, C. N. Afonso, and J. Piqueras, J. Appl. Phys. 71, 1032 (1992).
17. J. Humilícek, M. Garriga, M. I. Alonso, and M. Cardona, J. Appl. Phys. 65, 2827 (1989).
18. Handbook of Optical Constants of Solids, edited by E. D. Palik (Academic, New York 1985)
19. F. Foulon, E. Fogarassy, A. Salaoui, C. Fuchs, S. de Unamuno, and P. Siffert, Appl. Phys. A 45, 361 (1988).
20. G. E. Jellison, Jr., and D. H. Lowndes, Appl. Phys. Lett. 51, 352 (1987).
21. D. P. Brunco, M. O. Thompson, D. E. Hoglund, and M. J. Aziz, Mater. Res. Soc. Symp. Proc. 354, (1995).
22. D. P. Brunco, M. O. Thompson, D. E. Hoglund, M. J. Aziz, and H. -J. Gossman, J. Appl. Phys. 78, 1575 (1995).
23. H. J. Leamy, C. Doherty, K. C. R. Chiu, J. M. Poate, T. T. Sheng, and G. K. Celler, in Laser and Electron Beam Processing of Materials, edited by C. W. White and P. S. Peercy (Academic, New York, 1980), p. 581.