Effects of surface oxide on the rapid thermal nitridation of Si(001)

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 2, 1996, Pages 462-464

  Copel, M ^a   Tromp, R M ^a   Timme, H J ^b   Penner, K ^b   Nakao, T ^b  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b IBM RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; CHEMICAL VAPOR DEPOSITION; IONS; MONOLAYERS; NITRIDING; OXYGEN; SEMICONDUCTING SILICON; SURFACE PHENOMENA;

MEDIUM ENERGY ION SCATTERING; RAPID THERMAL NITRIDATION; SURFACE OXIDE;

OXIDES;

EID: 0030104879     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580106     Document Type: Article

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