Amorphous layer formation on nickel alloy surface by intense pulsed ion beam irradiation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 3, 1996, Pages 1857-1861

  Yatsuzuka, Mitsuyasu ^a   Hashimoto, Yoshiyuki ^b   Yamasaki, Tohru ^a   Uchida, Hitoshi ^a  

^a UNIVERSITY OF HYOGO   (Japan)

^b KOBE CITY COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Amorphous layer formation; Intense pulse ion beam; Ion beam irradiation; Metal surface treatment

Indexed keywords

CARBON; COOLING; CURRENT DENSITY; FLUORINE; HEATING; ION BEAMS; ION BOMBARDMENT; IRRADIATION; NICKEL ALLOYS; SUBSTRATES; SURFACES; THERMAL DIFFUSION;

AMORPHOUS LAYER FORMATION; BOILING POINT; INTENSE PULSED ION BEAM; ION BEAM IRRADIATION; NICKEL CHROMIUM PHOSPHORUS BORON ALLOY; PULSE DURATION;

AMORPHOUS MATERIALS;

EID: 0030103805     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.1857     Document Type: Article

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