SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 3, 1996, Pages 1690-1695

Kinetic study of silicon nitride growth from dichlorosilane and ammonia

(6) Ogata, Tamotsu a Sorita, Tetsuji a Kobayashi, Kiyoteru a Matsui, Yasuji a Horie, Kazuo b Hirayama, Makoto a

a MITSUBISHI ELECTRIC CORPORATION (Japan)

b KINKI UNIVERSITY (Japan)

Author keywords

Ammonia; Deposition mechanism; Dichlorosilane; Reaction rate constant; Silicon nitride films; Thickness profile

Indexed keywords

AMMONIA; DECOMPOSITION; DEPOSITION; DIFFERENTIAL SCANNING CALORIMETRY; MATHEMATICAL MODELS; REACTION KINETICS; SEMICONDUCTING FILMS; SILANES; SILICON NITRIDE; SILICON WAFERS; THICKNESS MEASUREMENT;

BATCH FURNACE; DICHLOROSILANE; REACTION RATE CONSTANT; SILICON NITRIDE GROWTH; SURFACE REACTION RATE;

FILM GROWTH;

EID: 0030103269 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.35.1690 Document Type: Article

Times cited : (4)

References (14)

1
- 0003280863
- J. Bloem and W. A. Classen: J. Cryst. Growth 49 (1980) 435.
- (1980) J. Cryst. Growth , vol.49 , pp. 435
- Bloem, J.¹ Classen, W.A.²

2
- 85025758518
- W. A. Classen and J. Bloem: J. Cryst. Growth 50 (1980) 807.
- (1980) J. Cryst. Growth , vol.50 , pp. 807
- Classen, W.A.¹ Bloem, J.²

3
- 0029197074
- M. Hierlemann, A. Kersch, C. Werner and H. Schafer: J. Electrochem. Soc. 142 (1995) 259.
- (1995) J. Electrochem. Soc. , vol.142 , pp. 259
- Hierlemann, M.¹ Kersch, A.² Werner, C.³ Schafer, H.⁴

4
- 3743145948
- V. S. Ban and S. L. Gilbert: J. Electrochem. Soc. 50 (1980) 807.
- (1980) J. Electrochem. Soc. , vol.50 , pp. 807
- Ban, V.S.¹ Gilbert, S.L.²

5
- 0000031480
- J. Nishizawa and M. Saito: J. Cryst. Growth 52 (1981) 213.
- (1981) J. Cryst. Growth , vol.52 , pp. 213
- Nishizawa, J.¹ Saito, M.²

6
- 0025491972
- G. Peev, L. Zambov and I. Nedev: Thin Solid Films 190 (1990) 341.
- (1990) Thin Solid Films , vol.190 , pp. 341
- Peev, G.¹ Zambov, L.² Nedev, I.³

7
- 0020135453
- C. E. Morosanu and E. Segal: Thin Solid Films 91 (1982) 251.
- (1982) Thin Solid Films , vol.91 , pp. 251
- Morosanu, C.E.¹ Segal, E.²

8
- 0023383614
- K. F. Roenigk and K. F. Jensen: J. Electrochem. Soc. 134 (1987) 1777.
- (1987) J. Electrochem. Soc. , vol.134 , pp. 1777
- Roenigk, K.F.¹ Jensen, K.F.²

9
- 0010845471
- S. Koseki and A. Ishitani: J. Appl. Phys. 72 (1992) 5808.
- (1992) J. Appl. Phys. , vol.72 , pp. 5808
- Koseki, S.¹ Ishitani, A.²

10
- 0028725371
- T. Sorita, T. Satake, H. Adachi, T. Ogata and K. Kobayashi: J. Electrochem. Soc. 141 (1994) 3505.
- (1994) J. Electrochem. Soc. , vol.141 , pp. 3505
- Sorita, T.¹ Satake, T.² Adachi, H.³ Ogata, T.⁴ Kobayashi, K.⁵

11
- 3743119294
- G. H. Kruppa, S. K. Shin and J. L. Beauchamp: J. Phys. Chem. 94 (1990) 3327.
- (1990) J. Phys. Chem. , vol.94 , pp. 3327
- Kruppa, G.H.¹ Shin, S.K.² Beauchamp, J.L.³

12
- 3743148229
- in Japanese
- T. Manabe: Ultra Clean Technol. 4 (1992) 56 [in Japanese].
- (1992) Ultra Clean Technol. , vol.4 , pp. 56
- Manabe, T.¹

13
- 1642577314
- Dow Chemical Company, Michigan, 2nd ed.
- D. R. Stull and H. Prophet: JANAF Thermochemical Tables (Dow Chemical Company, Michigan, 1971) 2nd ed.
- (1971) JANAF Thermochemical Tables
- Stull, D.R.¹ Prophet, H.²

14
- 0042342550
- S. Koseki and A. Ishitani: Bull. Chem. Soc. Jpn. 65 (1992) 3174.
- (1992) Bull. Chem. Soc. Jpn. , vol.65 , pp. 3174
- Koseki, S.¹ Ishitani, A.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.