Diode-based thermal r.m.s. converter with on-chip circuitry fabricated using CMOS technology

Sensors and Actuators, A: Physical

Volumn 52, Issue 1-3, 1996, Pages 33-40

  Klaassen, Erno H ^a   Reay, Richard J ^a   Kovacs, Gregory T A ^a,b  

^a Stanford University   (United States)

^b STANFORD UNIVERSITY   (United States)

Author keywords

Anisotropic etching; Electrochemical etch stop; Micromachining; R.m.s. Converter; Tetramethyl ammonium hydroxide (TMAH); Thermal isolation

Indexed keywords

CMOS INTEGRATED CIRCUITS; ETCHING; MICROMACHINING; SEMICONDUCTING SILICON; SEMICONDUCTOR DIODES; SINGLE CRYSTALS; THERMAL EFFECTS;

ANISOTROPIC ETCHING; ELECTROCHEMICAL ETCH STOP; ROOT MEAN SQUARE (R.M.S.); TETRAMETHYL AMMONIUM HYDROXIDE (TMAH); THERMAL R.M.S. CONVERTERS;

ELECTRIC CONVERTERS;

EID: 0030102057     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/0924-4247(96)80122-1     Document Type: Article

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