The photolysis of NO dimers, adsorbed on an MgF2 surface, at 248 nm

Chemical Physics Letters

Volumn 250, Issue 3-4, 1996, Pages 342-348

  Simpson, C J S M ^a   Griffiths, P T ^a   Curry, J M ^a   Towrie, M ^b  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030101278     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/0009-2614(96)00079-6     Document Type: Article

References (10)

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