Structural studies of parasexiphenyl thin films: Importance of the deposition parameters

Thin Solid Films

Volumn 274, Issue 1-2, 1996, Pages 35-45

  Athouel L ^a,b   Froyer, G ^a,b   Riou, M T ^c   Schott, M ^d  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b UNIVERSITÉ DE NANTES   (France)

^c ORANGE LABS   (France)

^d UNIVERSITÉ PARIS DESCARTES   (France)

Author keywords

Deposition process; Optical spectroscopy; Organic substances; Polymers; Structural properties; X ray diffraction

Indexed keywords

CATALYSTS; CONDENSATION; DEPOSITION; ELECTROCHEMISTRY; NICKEL; STRUCTURE (COMPOSITION); SUBLIMATION; SUBSTRATES; SYNTHESIS (CHEMICAL); TEXTURES; THERMAL GRADIENTS; VACUUM APPLICATIONS;

CRYSTALLINITY; ELECTROREDUCTION; MOLECULAR AXIS; MONOBROMOTERPHENYL; NICKEL CATALYST; PARASEXIPHENYL THIN FILMS; TILT ANGLE; VACUUM CONDENSATION; VACUUM SUBLIMATION;

THIN FILMS;

EID: 0030101077     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)07081-8     Document Type: Article

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