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Volumn 32, Issue 5, 1995, Pages 385-388
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Comparison of quantum Hall effect resistance standards of the OFMET and the BIPM
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BIPM
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Author keywords
[No Author keywords available]
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Indexed keywords
BUREAU INTERNATIONAL DES PODS ET MESURES (BIPM);
QUANTIZED RESISTANCE;
QUANTUM HALL EFFECT RESISTANCE STANDARDS;
SWISS FEDERAL OFFICE OF METROLOGY (OFMET);
ELECTRIC RESISTANCE MEASUREMENT;
SEMICONDUCTOR DEVICES;
STANDARDS;
HALL EFFECT;
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EID: 0030100806
PISSN: 00261394
EISSN: None
Source Type: Journal
DOI: 10.1088/0026-1394/32/5/6 Document Type: Article |
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Times cited : (18)
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References (5)
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