Effects of texturing and microbridge length on the IR responsivity OfYBa2Cu3Ox thin film

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 3, 1996, Pages 1716-1719

  Bae, Sung Joon ^a   Hong, Seungbum ^a   Kim, Eunah ^a   Shin, Woosuck ^a   Cho, Chang Hyun ^a   Kim, Young Kun ^a   Bea, Youn Soo ^b   Sung, Tae Hyun ^b   No, Kwangsoo ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Han Ma eum Ener Sci Inst #301   (South Korea)

Author keywords

IR responsivity; MOCVD; Superconductor; Texturing; YBa2Cu3Ox

Indexed keywords

ETCHING; GRAIN BOUNDARIES; INFRARED SPECTROSCOPY; JOSEPHSON JUNCTION DEVICES; MAGNESIA; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; OXIDE SUPERCONDUCTORS; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; TEXTURES;

DEPOSITION TEMPERATURE; INFRARED RESPONSIVITY; MICROBRIDGE PATTERNS; YTTRIUM BARIUM CUPRATES;

SUPERCONDUCTING FILMS;

EID: 0030100709     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.1716     Document Type: Article

References (9)

1. M. Fardmanesh, M. Ihran, K. Scoles and A. Rothwarf: AIP Conf. Proc. (1993).
2. M. Danerud and D. Winkler: J. Appl. Phys. 76 (1994) 1902.
3. N. Bluzer: Phys. Rev. B 44 (1991) 10222.
4. Y. Yoshisato, A. Takeoka, M. Takai, K. Niki, S. Yoshikawa, T. Hirano and S. Nakano: Jpn. J. Appl. Phys. 30 (1991) 661.
5. S. Noge, T. Yamashita, Z. Wang, T. Matsui, H. Kurosawa, H. Yamane and T. Hirai: Jpn. J. Appl. Phys. 28 (1989) L1581.
6. D. Dimos and P. Chauhari: Phys. Rev. B 41 (1989) 4038.
7. C. B. Eom, A. F. Marshall, Y. Suzuki and T. H. Geballe: Phys. Rev. B 46 (1992) 902.
8. M. Mukaida, S. Miyazawa and J. Kobayshi: Proc. 5th Int. Symp. Superconductivity, Nov. 1992, Kobe, p. 893.
9. C. Cho, D. Hwang, K. No and J. S. Chun: J. Mater. Sci. 28 (1993) 2915.