Correlation between negative hydrogen ion production and work function of plasma grid surface in a cesium-introduced volume-production-type negative hydrogen ion source

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 3, 1996, Pages 1894-1900

  Shinto, Katsuhiro ^a   Okumura, Yoshikazu ^b   Ando, Toshimitsu ^a   Wada, Motoi ^a   Tsuda, Hiroshi ^a   Inoue, Takashi ^b   Miyamoto, Kenji ^b   Nagase, Akihito ^b  

^a DOSHISHA UNIVERSITY   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

Cs introduction; Negative hydrogen ion (H ); Photoelectron; Plasma grid; Volume production type negative ion source; Work function

Indexed keywords

ARGON; ATOMS; CESIUM; ELECTRIC CURRENTS; GAS LASERS; HYDROGEN; IONS; NUMERICAL ANALYSIS; PHOTONS; QUANTUM EFFICIENCY; SURFACES; VACUUM APPLICATIONS;

CESIUM INTRODUCED VOLUME PRODUCTION; CESIUM MOLYBDENUM SURFACE; EXTRACTED HYDROGEN ION CURRENT; KINETIC ENERGY; NEGATIVE HYDROGEN ION PRODUCTION; NEGATIVE HYDROGEN ION SOURCE; PLASMA GRID SURFACE; WORK FUNCTION;

PLASMA SOURCES;

EID: 0030100278     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.1894     Document Type: Article

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