The corrosion behaviour of copper in neutral tap water. Part I: Corrosion mechanisms

Corrosion Science

Volumn 38, Issue 3, 1996, Pages 369-385

  Feng, Y ^a   Teo, W K ^a   Siow, K S ^a   Tan, K L ^a   Hsieh, A K ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

A. copper; B. EIS

Indexed keywords

COPPER OXIDES; CORROSION RESISTANCE; DIFFUSION IN SOLIDS; ELECTROCHEMISTRY; EQUIVALENT CIRCUITS; FILM GROWTH; INTERFACES (MATERIALS); REACTION KINETICS; SPECTROSCOPIC ANALYSIS; WATER; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; NEUTRAL AERATED SIMULATED TAP WATER;

COPPER CORROSION;

COPPER; CORROSION RATES; POLARIZATION; RESISTANCE;

EID: 0030088389     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0010-938X(96)00110-2     Document Type: Article

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