Patterning of epitaxial organic films by selective epitaxial growth

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 2 B, 1996, Pages

  Suzuki, Akira ^a   Shimada, Toshihiro ^a   Koma, Atsushi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; EPITAXIAL GROWTH; MASKS; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SINGLE CRYSTALS; SPECTROMETERS; VAN DER WAALS FORCES; VANADIUM COMPOUNDS;

EPITAXIAL FILMS; MICROSCOPIC PATTERNING; ORGANIC FILMS; SELECTIVE GROWTH; STICKING COEFFICIENT; VAN DER WAALS EPITAXY; VANADYL PHTHALOCYANINE;

OPTICAL FILMS;

EID: 0030087091     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.35.L254     Document Type: Article

References (14)