DC conduction through UHV deposited tellurium films

Vacuum

Volumn 47, Issue 2, 1996, Pages 129-131

  Swan, R ^a   Ray, A K ^b   Travis, J R ^b   Evans, K ^b  

^a LONDON SOUTH BANK UNIVERSITY   (United Kingdom)

^b SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC FIELD EFFECTS; ELECTRIC RESISTANCE; HYSTERESIS; TELLURIUM; THIN FILMS; VACUUM DEPOSITED COATINGS;

OHMIC CONDUCTANCE; ULTRAHIGH VACUUM DEPOSITION;

METALLIC FILMS;

EID: 0030087017     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0042-207X(95)00224-3     Document Type: Article

References (7)

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3. K Okuyama and Y Kumagi, J Appl Phys, 46, 1473 (1975).
4. R Mathur and A Kumar, Thin Solid Films, 146, 127 (1987).
5. A Mansingh and A K Garg, Thin Solid Films, 131, 41 (1985).
6. A K Ray, R Swan and C A Hogarth, J Non-Crystalline Solids, 168, 150 (1994).
7. S K Dey, J Vac Sci Technol, 10, 227 (1973).