Ion density and temperature distributions in an inductively coupled high-plasma density reactor

IEEE Transactions on Plasma Science

Volumn 24, Issue 1, 1996, Pages 129-

  Lymberopoulos, Dimitris P ^a   Wise, Richard S ^a   Economou, Demetre J ^a   Bartel, Timothy J ^b  

^a University of Houston   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRIC COILS; ELECTRIC FIELD EFFECTS; IONS; MONTE CARLO METHODS; PLASMA ETCHING; PLASMA SHEATHS; PLASMA SIMULATION; SILICON WAFERS; TEMPERATURE DISTRIBUTION;

INDUCTION COIL; INDUCTIVELY COUPLED HIGH PLASMA DENSITY REACTOR; ION DENSITY DISTRIBUTION;

PLASMA DEVICES;

EID: 0030086874     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.491746     Document Type: Article

References (4)

1. G. A. Bird {\it Molecular Gas Dynamics and the Direct Simulation of Gas Flows.}\quad Oxford 1994 Oxford
2. D. Tsu R. T. Young S. R. Ovshinsky C. C. Klepper L. A. Berry Ion and neutral argon temperatures in electron cyclotron resonance plasma by Doppler broadened emission spectroscopy J. Vacuum Sci. Technol. A 13 935 940 1995
3. D. J. Economou T. J. Bartel R. S. Wise D. P. Lymberopoulos Two-dimensional direct simulation Monte Carlo (DSMC) of reactive neutral and ion flow in a high density plasma reactor IEEE Trans. Plasma Sci. 23 581 590 1995 27 9849 467978
4. J. Zheng R. P. Brinkmann J. P. McVittie The effect of the presheath on the ion angular distribution at the wafer surface J. Vacuum Sci. Technol. A 13 859 864 1995