Rapid thermal processing for ULSI applications: an overview

Solid State Technology

Volumn 39, Issue 2, 1996, Pages

  Reid, Kimberly G ^a   Sitaram, A R ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CMOS INTEGRATED CIRCUITS; COSTS; SEMICONDUCTOR DEVICE MANUFACTURE; ULSI CIRCUITS;

BATCH FURNACES; COST OF OWNERSHIP; RAPID THERMAL PROCESSING; SINGLE WAFER PROCESSING;

HEAT TREATMENT;

EID: 0030086493     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (19)