Fabrication of high-performance extended-cavity double-quantum-well lasers with integrated passive sections

IEE Proceedings: Optoelectronics

Volumn 143, Issue 1, 1996, Pages 94-100

  Yee, H H ^a   Ayling, S ^a   De La Rue, R M ^a   Vogele B ^a   Song, Y P ^a,b  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

^b Electrotech   (United Kingdom)

Author keywords

Lasers; Propagation loss; Quantum wells; Ridge waveguide lasers

Indexed keywords

ELECTRIC CURRENTS; ELECTRON DEVICE MANUFACTURE; ENERGY GAP; INTEGRATED OPTOELECTRONICS; LASER RESONATORS; LIGHT PROPAGATION; OPTICAL WAVEGUIDES; REACTIVE ION ETCHING; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE;

DIELECTRIC CAP DISORDERING; DOUBLE QUANTUM WELL LASERS; INTEGRATED PASSIVE WAVEGUIDE SECTIONS; LASING WAVELENGTHS; PLASMA REACTIVE ION ETCHING; PROPAGATION LOSS; QUANTUM WELL INTERMIXING; RIDGE WAVEGUIDE LASERS; THRESHOLD CURRENT;

QUANTUM WELL LASERS;

EID: 0030085551     PISSN: 13502433     EISSN: None     Source Type: Journal    
DOI: 10.1049/ip-opt:19960217     Document Type: Article

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