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Volumn 32, Issue 5, 1996, Pages 491-493
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GaAs/n-AlGaAs field-effect transistor with embedded InAs quantum traps and its programmable threshold characteristics
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Author keywords
Aluminium gallium arsenide; Field effect transistors; Gallium arsenide
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Indexed keywords
CARRIER CONCENTRATION;
ELECTRON ENERGY LEVELS;
ELECTRONIC PROPERTIES;
GATES (TRANSISTOR);
HETEROJUNCTIONS;
MOLECULAR BEAM EPITAXY;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR QUANTUM DOTS;
ALUMINUM GALLIUM ARSENIDE;
ELECTRON CONCENTRATION;
ELECTRON GAS;
GATE VOLTAGE;
HETEROINTERFACE;
PROGRAMMABLE THRESHOLD;
QUANTUM TRAPS;
THRESHOLD VOLTAGE;
FIELD EFFECT TRANSISTORS;
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EID: 0030084942
PISSN: 00135194
EISSN: None
Source Type: Journal
DOI: 10.1049/el:19960293 Document Type: Article |
Times cited : (62)
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References (4)
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