Comparing models for the growth of Silicon-Rich Oxides (SRO)

IEEE Transactions on Semiconductor Manufacturing

Volumn 9, Issue 1, 1996, Pages 74-81

  Dündar, Günhan ^b   Rose, Kenneth ^a,b  

^a IEEE

^b RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; NEURAL NETWORKS; OXIDES; REACTION KINETICS; SEMICONDUCTOR DEVICE MODELS; SURFACES;

RESPONSE SURFACE MODEL; SILICON RICH OXIDES (SRO);

SEMICONDUCTING FILMS;

EID: 0030084860     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.484285     Document Type: Review

References (23)

1. G. P. Box, W. G. Hunter, and J. S. Hunter, Statistics for Experimenters. New York: Wiley, 1978.
2. A. J. Owens and M. T. Mocella, "An experimental design advisor and neural network analysis package," in Proc. IEEE Int. Workshop on Artificial Neural Networks, Grenada, 1991.
3. M. T. Mocella, J. A. Bondur, and T. R. Turner, "Etch process characterization using neural network methodology: A case study," SPIE Conf. Proc., 1991, vol. 1594, pp. 232-242.
4. C. D. Himmel and G. S. May, "Advantages of plasma etch modeling using neural networks over statistical techniques," IEEE Trans. Semicond. Manufact., vol. 6, pp. 103-111, 1993.
5. B. Kim and G. S. May, "An optimal nueral network process model for plasma etching," IEEE Trans. Semicond. Manufact., vol. 7, pp. 12-21, 1994.
6. E. A. Rietman and E. R. Lory, "Use of neural networks in modeling semiconductor manufacturing processes: An example for plasma etch modeling," IEEE Trans. Semicond. Manufact., vol. 6, pp. 343-347, 1993.
7. Y. L. Huang et al., "Constructing a reliable neural network model for a plasma etching process using limited experimental data," IEEE Trans. Semicond. Manufact., vol. 7, pp. 333-344, 1994.
8. F. Nadi, A. M. Agogino, and D. A. Hodges, "Use of influence diagrams and neural networks in modeling semiconductor manufacturing processes," IEEE Trans. Semicond. Manufact., vol. 4, pp. 52-58, 1991.
9. C. H. Lam, "A two-device nonvolatile dynamic random-access memory cell model," Ph.D. Thesis, Rensselaer Polytechnic Institute, Troy, NY, May 1988.
10. C. H. Lam and K. Rose, "Chemical kinetics of silicon-rich oxide growth in an LPCVD reactor," Mat. Res. Soc. Symp. Proc., 1989, vol. 131, pp. 281-287.
11. P. A. Emmi, "Growth and characterization of silicon-rich oxide," M.S. Thesis, Rensselaer Polytechnic Institute, Sept. 1990.
12. K.-T. Chang, C. Lam, and K. Rose, "Enhanced conduction in SIPOS films with high oxygen content," Mat. Res. Soc. Symp. Proc., 1988, vol. 105, pp. 193-198.
13. S. Mukherjee et al., "The effect of SIPOS passivation on DC a switching performance of high voltage MOS transistors," IEDM Tech. Digest, p. 646, 1986.
14. T.-M. Chuang, R. J. Gutmann, and K. Rose, "Modeling and characterization of SIPOS emitter and quasi-SIS emitter bipolar transistors," IEEE Trans. Electron Devices, vol. 40, pp. 796-803, 1993.
15. K.-T. Chang, C. Lam, and K. Rose, "Conduction and injection in off-stoichiometry oxides," Mat. Res. Soc. Symp. Proc., 1988, vol. 106, pp. 107-112.
16. 2 films and experimental application," J. Appl. Phys., vol. 51, pp. 2722-2735, 1980.
17. 2-SRO DEIS structures for EAROM's," IEEE Trans. Electron Devices, vol. 35, pp. 1645-1650, 1988.
18. D. J. DiMaria et al., "Extended cyclability in electrically-alterable read-only memories," IEEE Electron Device Lett., vol. EDL-3, pp. 191-195, 1982.
19. L. Dori et al., "Optimized silicon-rich oxide (SRO) deposition process for 5-V-only flash EEPROM applications," IEEE Electron Device Lett., vol. 14, pp. 283-285, 1993.
20. D. H. Bouldin, C. H. Lam, and K. Rose, "Composition determination of microcrystal-line two-phase silicon-rich oxides," Mat. Res. Soc. Symp. Proc., 1990, vol. 164, pp. 33-38.
21. M. L. Hitchmann and J. Kane, "Semi-insulating polysilicon (SIPOS) deposition in a low-pressure CVD reactor," J. Crystal Growth, vol. 55, pp. 485-500, 1981.
22. M. L. Hitchmann, J. Kane, and A. E. Widmer, "Polysilicon growth kinetics in a low pressure chemical vapor deposition reactor," Thin Solid Films, vol. 59, pp. 231-247, 1979.
23. F.-C. Hsu, "Visualized response surface analysis of the internal representations of neural networks," M.S. Thesis, Rensselaer Polytechnic Institute, Troy, NY, May 1995.