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Surface Science

Volumn 347, Issue 1-2, 1996, Pages 97-104

Adsorption of molecular fluorine on the Si(100) surface: An ellipsometric study

(3) Aliev, V S a Kruchinin, V N a Baklanov, M R a

a INSTITUTE OF SEMICONDUCTOR PHYSICS (Russian Federation)

Author keywords

Adsorption kinetics; Halogens; Low index single crystal surfaces; Silicon; Solid gas interfaces

Indexed keywords

ACTIVATION ENERGY; CRYSTAL ORIENTATION; DESORPTION; ELLIPSOMETRY; ETCHING; PHASE INTERFACES; POLISHING; REACTION KINETICS; SATURATION (MATERIALS COMPOSITION); SILICON; SINGLE CRYSTALS;

ADSORPTION STATES; LOW INDEX SINGLE CRYSTAL SURFACES; MOLECULAR FLUORINE;

ADSORPTION;

EID: 0030084729 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/0039-6028(95)00935-3 Document Type: Article

Times cited : (3)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.