Digital signal measurements on passivated submicron ICs by scanning force microscope-testing

Microelectronic Engineering

Volumn 31, Issue 1-4, 1996, Pages 181-186

  Sprengepiel, J ^a   Bohm C ^a   Kubalek, E ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; MICROSCOPIC EXAMINATION; PASSIVE NETWORKS; PERMITTIVITY; VOLTAGE MEASUREMENT;

DEVICE UNDER TEST; DIGITAL SIGNAL MEASUREMENT; ELECTRIC FORCE; SCANNING FORCE MICROSCOPE; TOPOGRAPHIC MEASUREMENT;

INTEGRATED CIRCUIT TESTING;

EID: 0030084644     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00341-X     Document Type: Article

References (6)

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2. W. Mertin, K. D. Herrmann, E. Kubalek, R. Lackmann, G. Weichert, G. Zimmer, "The capacitive coupling error and the capacitive coupling cross talk in electron beam testing of passivated IC and measures for their reduction", Microelectronic Engineering, Vol. 12, Nr. 1-4, 1990, 349-357
3. A. S. Hou, F. Ho, D. Bloom, "Picosecond electrical sampling using a scanning force microscope", Electronics Letters, Vol. 28, No. 25, December 1992, 2302-2303
4. C. Böhm, F. Saurenbach, P. Taschner, C. Roths, E. Kubalek, "Voltage contrast in integrated circuits with 100 nm spatial resolution by scanning force microscopy", J. Phys. D: Appl. Phys., Vol. 26, 1993, 1801-1805
5. TopoMetrix (TMX-2000 Explorer), Pallaswiesenstr. 180, 64293 Darmstadt, Germany
6. H. Richter, "Test chip for the characterization of electron beam measurement systems", Microelectronic Engineering, Vol. 16, Numbers 1-4, March 1992, 225-232