2-D mesh adaption and flux discretizations for dopant diffusion modeling

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

Volumn 15, Issue 2, 1996, Pages 194-207

  Lin, Chih Chuan ^a   Law, Mark E ^a  

^a UNIVERSITY OF FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADAPTIVE ALGORITHMS; COMPUTATIONAL GEOMETRY; DIFFUSION IN SOLIDS; ERROR ANALYSIS; INTEGRATED CIRCUIT MANUFACTURE; MULTILAYERS; OBJECT ORIENTED PROGRAMMING; SEMICONDUCTOR DOPING; VLSI CIRCUITS;

DISCRETIZATION ERROR CONTROL; DOPANT CONCENTRATION; DOPANT DIFFUSION; ERROR ESTIMATION; FLORIDA OBJECT ORIENTED PROCESS SIMULATOR; MESH ADAPTATION; PROCESS SIMULATION;

COMPUTER SIMULATION;

EID: 0030084592     PISSN: 02780070     EISSN: None     Source Type: Journal    
DOI: 10.1109/43.486665     Document Type: Article

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