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Volumn 27, Issue 1, 1996, Pages 67-72

Double epitaxial layer power Schottky diodes with end in the ramp oxide technique

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CONTACTS; ETCHING; HIGH TEMPERATURE OPERATIONS; OXIDES; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES;

EID: 0030084231     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/0026-2692(95)00023-2     Document Type: Article
Times cited : (2)

References (12)
  • 5
    • 0026977199 scopus 로고
    • On the reverse blocking characteristics of Schottky power diodes
    • S.L. Tu and B.J. Baliga, On the reverse blocking characteristics of Schottky power diodes, IEEE Trans. Electron Devices, ED-39 (1992) 2813.
    • (1992) IEEE Trans. Electron Devices , vol.ED-39 , pp. 2813
    • Tu, S.L.1    Baliga, B.J.2
  • 8
    • 0041151126 scopus 로고
    • Diode schottky de curenti reziduali foarte mici
    • Gh. Brezeanu and M. Badila, Diode Schottky de curenti reziduali foarte mici, Automatica Electronica, 35 (1991) 45.
    • (1991) Automatica Electronica , vol.35 , pp. 45
    • Brezeanu, Gh.1    Badila, M.2
  • 9
    • 85029991291 scopus 로고
    • Bidimensional simulation of electric field and potential distribution in Schottky diodes with oxide ramp profile
    • D. Dascalu and Gh. Brezeanu (eds.), Ed. Academiei Romane, Bucharest
    • Gh. Brezeanu, M. Badila, C. Georgian and C. Manzararu, Bidimensional simulation of electric field and potential distribution in Schottky diodes with oxide ramp profile, in D. Dascalu and Gh. Brezeanu (eds.), Noi Cercetari in Microelectronica, Vol. 17, Ed. Academiei Romane, Bucharest, 1994, p. 74.
    • (1994) Noi Cercetari in Microelectronica , vol.17 , pp. 74
    • Brezeanu, Gh.1    Badila, M.2    Georgian, C.3    Manzararu, C.4
  • 10
    • 0039371632 scopus 로고
    • Double epitaxial layer power Schottky diodes with end in the ramp oxide technique
    • Sinaia, Romania
    • M. Badila and Gh. Brezeanu, Double epitaxial layer power Schottky diodes with end in the ramp oxide technique, Proc. 16th Annual Semiconductor Conf., CAS, Sinaia, Romania, 1993, p. 255.
    • (1993) Proc. 16th Annual Semiconductor Conf., CAS , pp. 255
    • Badila, M.1    Brezeanu, Gh.2
  • 12
    • 0025802189 scopus 로고
    • Modelling of gradual interface intimate silicide/Si Schottky contacts
    • Gh. Brezeanu and P.A. Dan, Modelling of gradual interface intimate silicide/Si Schottky contacts, Solid-State Electron., 34 (1991) 95.
    • (1991) Solid-State Electron. , vol.34 , pp. 95
    • Brezeanu, Gh.1    Dan, P.A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.