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Volumn 31, Issue 1-4, 1996, Pages 25-32

Application of electron-beam testing technique to potential profile measurement in a-Si:H solar cells at various states of operation

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; DEGRADATION; ELECTRIC FIELD MEASUREMENT; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON ENERGY LEVELS; MASKS; PLASMA ETCHING; SILICON SOLAR CELLS;

EID: 0030084147     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00322-3     Document Type: Article
Times cited : (1)

References (8)
  • 1
    • 0040594017 scopus 로고
    • Hyperbolic approximation of non-uniform electric field for an analytical solution of the a-Si p-i-n structure
    • A. Luque et al., ed., Kluwer Acad. Publ., Dordrecht
    • D. Caputo, F. Irrera and F. Palma, Hyperbolic approximation of non-uniform electric field for an analytical solution of the a-Si p-i-n structure, in: A. Luque et al., ed., Proc. 9th E. C. Photovoltaic Solar Energy Conf., Kluwer Acad. Publ., Dordrecht, 1989, pp. 95-98
    • (1989) Proc. 9th E. C. Photovoltaic Solar Energy Conf. , pp. 95-98
    • Caputo, D.1    Irrera, F.2    Palma, F.3
  • 3
    • 0028398802 scopus 로고
    • Combining electron and focused ion beam techniques for failure analysis and design verification of integrated circuits
    • R. Heiland and A. Leslie, Combining electron and focused ion beam techniques for failure analysis and design verification of integrated circuits, Microelectronic Engineering 24 (1994) 51-58
    • (1994) Microelectronic Engineering , vol.24 , pp. 51-58
    • Heiland, R.1    Leslie, A.2
  • 4
    • 0040000866 scopus 로고
    • Utilization of an electron-beam tester for determining internal electric field profiles in micro-structured thin-film semiconductor devices
    • submitted
    • A. Jank, M. Jung, M. Lambert, G. Lichter and H. Schmoranzer, Utilization of an electron-beam tester for determining internal electric field profiles in micro-structured thin-film semiconductor devices, submitted to Scanning Microscopy (1995)
    • (1995) Scanning Microscopy
    • Jank, A.1    Jung, M.2    Lambert, M.3    Lichter, G.4    Schmoranzer, H.5
  • 5
    • 0028392220 scopus 로고
    • Application of electron-beam testing technique to potential profile measurements in thin film semiconductor devices
    • A. Jank, M. Jung and H. Schmoranzer, Application of electron-beam testing technique to potential profile measurements in thin film semiconductor devices, Microelectronic Engineering 24 (1994) 139-146
    • (1994) Microelectronic Engineering , vol.24 , pp. 139-146
    • Jank, A.1    Jung, M.2    Schmoranzer, H.3
  • 6
    • 0039408769 scopus 로고
    • Measurement of the electric field distribution in submicron semiconductor film devices by electron-beam testing
    • A. Lopez-Galindo and M. I. Rodriguez-Garcia, ed., Universidad de Granada, Granada
    • A. Jank, A. Mayer and H. Schmoranzer, Measurement of the electric field distribution in submicron semiconductor film devices by electron-beam testing, in: A. Lopez-Galindo and M. I. Rodriguez-Garcia, ed., Electron Microscopy 92, Universidad de Granada, Granada, 1992, Vol. II pp. 197-198
    • (1992) Electron Microscopy 92 , vol.2 , pp. 197-198
    • Jank, A.1    Mayer, A.2    Schmoranzer, H.3
  • 7
    • 0040000867 scopus 로고
    • Surface recombination in a-Si solar cells
    • H. Pfleiderer, Surface recombination in a-Si solar cells, J. Non-Cryst. Sol. 137&138 (1991) 1205-1208
    • (1991) J. Non-cryst. Sol. , vol.137-138 , pp. 1205-1208
    • Pfleiderer, H.1
  • 8
    • 0040000865 scopus 로고
    • Measurement of the electric potential in silicon solar cells employing an electron-beam tester
    • H. Schmoranzer, A. Mayer and A. Jank, Measurement of the electric potential in silicon solar cells employing an electron-beam tester, Fresenius J. Anal. Chem. 341 (1990) 251-254
    • (1990) Fresenius J. Anal. Chem. , vol.341 , pp. 251-254
    • Schmoranzer, H.1    Mayer, A.2    Jank, A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.