Distribution of excited species in plasmas by monochromatic imaging

IEEE Transactions on Plasma Science

Volumn 24, Issue 1, 1996, Pages 117-118

  Hareland, Willard A ^a   Buss, Richard J ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIC PHYSICS; CHARGE COUPLED DEVICES; COLOR IMAGE PROCESSING; GLOW DISCHARGES; IMAGING TECHNIQUES; LIGHT EMISSION; MONOCHROMATORS; OPTICAL RECORDING;

ARGON ATOMIC EMISSIONS; EXCITED SPECIES; GASEOUS ELECTRONIC CONFERENCE REFERENCE REACTOR; MONOCHROMATIC IMAGING; SPATIAL ENERGY DISTRIBUTION;

PLASMAS;

EID: 0030083556     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.491740     Document Type: Article

References (5)

1. A. R. Striganov and N. S. Sventitskii, Tables of Spectral Lines of Neutral and Ionized Atoms. New York: IFI/Plenum, 1968.
2. 2 etching of silicon," J. Electrochem. Soc., vol. 137, no. 4. pp. 1062-1078, 1990.
3. D. Economou, R. S. Aydil, and G. Barna, "In situ monitoring of etching uniformity in plasma reactors," Solid State Tech., pp. 107-111, 1991.
4. W. A. Hareland and R. J. Buss, "Optical diagnostic instrument for monitoring etch uniformity during plasma etching of polysilicon in a chlorine-helium plasma," Sandia Nat. Lab., U.S. Dep. Energy, SAND0455, June 1993.
5. B. Chapman, Glow Discharge Processes. New York: Wiley, 1980.