Adsorption of saturated hydrocarbons on the Si(111)-7 × 7 surface studied by photoelectron and photon stimulated desorption spectroscopies

Surface Science

Volumn 346, Issue 1-3, 1996, Pages 21-30

  Simons, J K ^a,d   Frigo, S P ^a,b   Taylor, J W ^a   Rosenberg, R A ^c  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b University of Wisconsin Madison   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

^d 3M COMPANY   (United States)

Author keywords

Alkanes; Molecule solid reactions; Near edge extended X ray absorption fine structure (NEXAFS); Photon stimulated desorption (PSD); Silicon; Soft X ray photoelectron spectroscopy; Solid gas interfaces; Surface chemical reaction

Indexed keywords

CHEMICAL REACTIONS; HYDROCARBONS; METHANE; MOLECULES; PARAFFINS; SILICON; SURFACES; TEMPERATURE; X RAY PHOTOELECTRON SPECTROSCOPY;

ADAMANTANE; MOLECULE SOLID REACTIONS; NEAR EDGE EXTENDED X RAY ABSORPTION FINE STRUCTURE; NEOPENTANE; PHOTON STIMULATED DESORPTION; SOFT X RAY PHOTOELECTRON SPECTROSCOPY; SOLID GAS INTERFACES; SURFACE CHEMICAL REACTIONS;

ADSORPTION;

EID: 0030083427     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(95)00938-8     Document Type: Article

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