Oxidation characteristics of Al-Ta thin alloy films as a passivation layer on Cu

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 2 PART A, 1996, Pages 704-708

  Takeyama, Mayumi ^a   Noya, Atsushi ^a   Taguchi, Masahiro ^a   Ichikawa, Takaaki ^a   Sasaki, Katsutaka ^a  

^a KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Al Ta alloy; Cu interconnects; Passivation; Preferential oxidation; Self passivating oxide; Surface oxide

Indexed keywords

ALLOYING; ALUMINUM; ALUMINUM ALLOYS; AUGER ELECTRON SPECTROSCOPY; COPPER; OXIDATION; OXIDES; PASSIVATION; TANTALUM ALLOYS; X RAY PHOTOELECTRON SPECTROSCOPY;

COPPER INTERCONNECTS; DEPTH PROFILING; PREFERENTIAL OXIDATION; SELF PASSIVATING OXIDE; SURFACE OXIDE;

THIN FILMS;

EID: 0030083042     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.704     Document Type: Article

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