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Journal of Materials Science

Volumn 31, Issue 3, 1996, Pages 685-693

A three-dimensional non-epitaxial atomistic growth model for thin-film deposition: Effect of surface mobility

(2) Xu, Shi a Lu, G Q b

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

b NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTALLIZATION; DEPOSITION; EFFECTS; MATHEMATICAL MODELS; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SPUTTERING; SURFACES; THREE DIMENSIONAL;

COLUMNAR STRUCTURE; PHYSICAL VAPOR DEPOSITION; SUBSTRATE TEMPERATURE; SURFACE MOBILITY; THIN FILM DEPOSITION; TWO DIMENSIONAL ATOMISTIC SIMULATION; ZONE STRUCTURE MODELS;

THIN FILMS;

EID: 0030082276 PISSN: 00222461 EISSN: None Source Type: Journal
DOI: 10.1007/BF00367886 Document Type: Article

Times cited : (2)

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