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Volumn 67, Issue 2, 1996, Pages 497-502
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Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films
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Author keywords
[No Author keywords available]
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Indexed keywords
ALGORITHMS;
ALUMINUM;
ANGLE MEASUREMENT;
ATOMIC FORCE MICROSCOPY;
CALCULATIONS;
LIGHT MODULATION;
LIGHT POLARIZATION;
MONOCHROMATORS;
SURFACE ROUGHNESS;
THIN FILMS;
ULTRAVIOLET RADIATION;
VACUUM APPLICATIONS;
DIFFERENTIAL PRESSURE SYSTEM;
FAR ULTRAVIOLET ABSOLUTE REFLECTOMETERS;
FRESNEL EQUATIONS;
INCIDENCE ANGLE;
OPTICAL CONSTANTS;
ULTRAHIGH VACUUM;
REFLECTOMETERS;
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EID: 0030082199
PISSN: 00346748
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1146628 Document Type: Article |
Times cited : (30)
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References (44)
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