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Volumn 29, Issue 2, 1996, Pages 378-387

The influence of electron reflection at the electrode and secondary electron emission on a strongly magnetized low-pressure RF discharge

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; COMPUTER SIMULATION; ELECTRODES; ELECTRON EMISSION; ELECTRON REFLECTION; ELECTRONS; IONS; MAGNETIC FIELDS; MONTE CARLO METHODS; PLASMA DENSITY; PLASMA SHEATHS; PLASMAS;

EID: 0030082098     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/29/2/014     Document Type: Article
Times cited : (6)

References (35)
  • 31
    • 5544248977 scopus 로고
    • Software Distribution Office, ILP, EECS Department, University of California, Berkeley
    • Verboncoeur J P, Vahedi V and Alves MP 1995 Technical Report 2, Software Distribution Office, ILP, EECS Department, University of California, Berkeley
    • (1995) Technical Report 2
    • Verboncoeur, J.P.1    Vahedi, V.2    Alves, M.P.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.