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Volumn 143, Issue 2, 1996, Pages 722-725
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Asymmetric distribution of oxygen concentration in the Si melt of a Czochralski system
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Author keywords
[No Author keywords available]
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Indexed keywords
CONCENTRATION (PROCESS);
CRYSTAL GROWTH FROM MELT;
ELECTROCHEMICAL ELECTRODES;
GRAPHITE;
NICKEL COMPOUNDS;
OXYGEN SENSORS;
SEMICONDUCTING SILICON;
TEMPERATURE DISTRIBUTION;
THERMOCOUPLES;
ZIRCONIA;
ASYMMETRIC DISTRIBUTION;
CZOCHRALSKI SYSTEM;
MACROSCOPIC SCALE;
MICROSCOPIC SCALE;
OXYGEN CONCENTRATION MEASUREMENT;
OXYGEN;
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EID: 0030081605
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1836508 Document Type: Article |
Times cited : (13)
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References (15)
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