Lithography error sources quantified by statistical metrology

Solid State Technology

Volumn 39, Issue 2, 1996, Pages

  Yu, Crid ^a   Spanos, Costas J ^a   Liu, Hua Yu ^a   Bartelink, Dirk ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ERRORS; INTEGRATED CIRCUIT MANUFACTURE; MATHEMATICAL MODELS; SILICON WAFERS; SPATIAL VARIABLES MEASUREMENT; STATISTICAL METHODS; TRANSFER FUNCTIONS; VLSI CIRCUITS;

DESIGN FOR MANUFACTURABILITY; ELECTRICAL CRITICAL DIMENSION MEASUREMENT; PHYSICAL DATA FILTERING; STATISTICAL METROLOGY;

LITHOGRAPHY;

EID: 0030081099     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (4)