|
Volumn 8, Issue 2, 1996, Pages 179-181
|
All selective MOVPE grown BH-LD's fabricated by the novel self-alignment process
a a a a a a
a
NEC CORPORATION
(Japan)
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ELECTRIC CURRENTS;
ETCHING;
HETEROJUNCTIONS;
MASKS;
METALLORGANIC VAPOR PHASE EPITAXY;
OPTICAL WAVEGUIDES;
PRESSURE;
SEMICONDUCTING INDIUM COMPOUNDS;
SEMICONDUCTOR DEVICE MANUFACTURE;
SUBSTRATES;
TEMPERATURE;
INDIUM GALLIUM ARSENIC PHOSPHIDE;
SELF ALIGNMENT MASK PATTERNING PROCESS;
SEMICONDUCTOR ETCHING;
SEMICONDUCTOR LASERS;
|
EID: 0030080721
PISSN: 10411135
EISSN: None
Source Type: Journal
DOI: 10.1109/68.484233 Document Type: Article |
Times cited : (31)
|
References (6)
|