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Volumn 35, Issue 2 SUPPL. B, 1996, Pages 960-964
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A high-performance 0.05 μm SOI MOS FET: Possibility of velocity overshoot
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Author keywords
Lattice temperature; Mobility; MOS FET; Nonstationary transport; Self heating; SOI; Transconductance; Velocity overshoot
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Indexed keywords
ELECTRIC RESISTANCE;
FABRICATION;
GATES (TRANSISTOR);
PERFORMANCE;
SEMICONDUCTOR DEVICE STRUCTURES;
SILICON ON INSULATOR TECHNOLOGY;
SUBSTRATES;
TRANSCONDUCTANCE;
TRANSMISSION ELECTRON MICROSCOPY;
VELOCITY;
CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY;
ELECTRON VELOCITY;
GATE OXIDES;
MOBILITY DEGRADATION;
SELF HEATING;
SIMOX WAFERS;
VELOCITY OVERSHOOT;
MOSFET DEVICES;
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EID: 0030080481
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.35.960 Document Type: Article |
Times cited : (9)
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References (12)
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