AFM microlithography of a thin chromium film covered with a thin resist Langmuir-Blodgett (LB) film

Thin Solid Films

Volumn 273, Issue 1-2, 1996, Pages 312-316

  Takano, Hajime ^a   Fujihira, Masamichi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Atomic force microscopy; Chromium; Etching; Langmuir blodgett films

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBOXYLIC ACIDS; DEFECTS; ETCHING; LANGMUIR BLODGETT FILMS; LITHOGRAPHY; PHOTORESISTS; PROBABILITY; THIN FILMS; WETTING;

QUARTZ PLATE; RESIST FILMS; TRICOSENOIC ACID; TUNNEL DEFECTS; WET ETCHING;

CHROMIUM;

EID: 0030079085     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)06794-9     Document Type: Article

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