Siliranes: Formation, isonitrile insertions, and thermal rearrangements

Tetrahedron Letters

Volumn 37, Issue 21, 1996, Pages 3675-3678

  Kroke, Edwin ^a   Willms, Stefan ^a   Weidenbruch, Manfred ^a   Saak, Wolfgang ^a   Pohl, Siegfried ^a   Marsmann, Heinrich ^b  

^a UNIVERSITY OF OLDENBURG   (Germany)

^b UNIVERSITY OF PADERBORN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ORGANOSILICON DERIVATIVE;

ARTICLE; DRUG SYNTHESIS; REACTION ANALYSIS;

EID: 0029944027     PISSN: 00404039     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-4039(96)00650-8     Document Type: Article

References (17)

1. See e.g.: a) Weidenbruch, M. Coord. Chem. Rev., 1994, 130, 275-300.
2. b) Belzner, J.; Ihmels, H.; Noltemeyer, M. Tetrahedron Lett., 1995, 36, 8187-8190.
3. Boudjouk, P.; Samaraweera, U.; Sooriyakumaran, R.; Chrisciel, J.; Anderson, K. R. Angew. Chem., 1988, 100, 1406-1407.
4. Zhang, S.; Conlin, R. T. J. Am. Chem. Soc., 1991, 113, 4272-4278.
5. +).
6. Boudjouk, P.; Black, E.; Kumarathasan, R. Organometallics, 1991, 10, 2095-2096.
7. Weidenbruch, M.; Kroke, E.; Marsmann, H.; Pohl, S.; Saak, W. J. Chem. Soc. Chem Commun., 1994, 1233-1234.
8. Kroke, E.; Weidenbruch, M.; Saak, W.; Pohl, S.; Marsmann, H. Organometallics, 1995, 14, 5695-5699.
9. Marsmann, H. in NMR - Basic Principles and Progress 17.: Oxygen-17 and Silicon-29, Diehl, P.; Fluck, E.; Kosfeld, R. (Eds.), Springer-Verlag, Berlin, 1981, 65-235.
10. Seyferth, D.; Duncan, D. P.; Shannon, M. L.; Goldman, E. W. Organometallics, 1984, 3, 574-578.
11. Seyferth, D.; Duncan, D. P.; Shannon, M. L. Organometallics, 1984, 3, 579-583.
12. Seyferth, D.; Annarelli, D. C.; Vick, S. C; Duncan, D. P. J. Organomet. Chem., 1980, 201, 179-195.
13. Boudjouk, P.; Black, E.; Kumarathasan, R.; Samaraweera, U.; Castellino, S.; Oliver, J. P.; Kampf, J. W. Organometallics, 1994, 13, 3715-3727.
14. +).
15. 3. Further details are deposited with the Cambridge Crystallographic Data Centre.
16. Silirane 24 was prepared according to the literature: see ref. 2.
17. +).