A neutron reflectivity study of the adsorption of aerosol-OT on self-assembled monolayers on silicon

Journal of Colloid and Interface Science

Volumn 178, Issue 2, 1996, Pages 531-537

  Fragneto, Giovanna ^a   Li, Zhi Xin ^a   Thomas, Robert K ^a   Rennie, Adrian R ^b   Penfold, Jeffrey ^c  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

aerosol OT; neutron reflectivity; solid liquid interface; surfactant adsorption

Indexed keywords

OCTADECYLTRICHLOROSILANE; SILICON DIOXIDE; SODIUM BIS(2 ETHYL 1 HEXANOL) SULFOSUCCINATE; SURFACTANT; UNCLASSIFIED DRUG;

ADSORPTION; AQUEOUS SOLUTION; ARTICLE; DENSITY; MEASUREMENT; PRIORITY JOURNAL; SURFACE PROPERTY; THICKNESS;

EID: 0029934311     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1006/jcis.1996.0148     Document Type: Article

References (35)

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10. Angst, D. L., and Simmons, G. W., Langmuir 7, 2236 (1991); De-Palma, V., and Tillman, N., Langmuir 5, 868 (1989); Wasserman, S. R., Tao, Y-T., and Whitesides, G. M., Langmuir 5, 1074 (1989); Maoz, R., and Sagiv, G., J. Colloid Interface Sci. 100, 465 (1984); Gun, J., Iscovici, R., and Sagiv, J., J. Colloid Interface Sci. 101, 201 (1984); Gun, J., and Sagiv, J., J. Colloid Interface Sci. 112, 457 (1986); Tillman, N., Ulman, A., and Penner, T. L., Langmuir 5, 101 (1989); Tillman, N., Ulman, A., Schildkraut, J. S., and Penner, T. L., J. Am. Chem. Soc. 110, 6136 (1988); Brandiss, S., and Margel, S., Langmuir 9, 1232 (1993); Silberzan, P., Leger, L., Ausserre, D., and Benattar, J. J., Langmuir 7, 1647 (1991); Pomerantz, M., Segmuller, A., Netzer, L., and Sagiv, J., Thin Solid Films 132, 153 (1985); Margel, S., Sivan, O., and Dolitzky, Y., Langmuir 7, 2317 (1991); Le Grange, J. D., Markham, J. L., and Kurkjian, C. R., Langmuir 9, 1749 (1993); Ruhe, J., Novotny, V. J., Kanazawa, K. K., Clarke, T., and Street, G. B., Langmuir 9, 2383 (1993); Wasserman, S. R., Whitesides, G. M., Tidswell, I. M., Ocko, B. M., Pershan, P. S., and Axe, J. D., J. Am. Chem. Soc. 111, 5852 (1989); Nakagawa, T., Kazufumi, O., and Kurumizawa, T., Langmuir 10, 525 (1994).
11. Angst, D. L., and Simmons, G. W., Langmuir 7, 2236 (1991); De-Palma, V., and Tillman, N., Langmuir 5, 868 (1989); Wasserman, S. R., Tao, Y-T., and Whitesides, G. M., Langmuir 5, 1074 (1989); Maoz, R., and Sagiv, G., J. Colloid Interface Sci. 100, 465 (1984); Gun, J., Iscovici, R., and Sagiv, J., J. Colloid Interface Sci. 101, 201 (1984); Gun, J., and Sagiv, J., J. Colloid Interface Sci. 112, 457 (1986); Tillman, N., Ulman, A., and Penner, T. L., Langmuir 5, 101 (1989); Tillman, N., Ulman, A., Schildkraut, J. S., and Penner, T. L., J. Am. Chem. Soc. 110, 6136 (1988); Brandiss, S., and Margel, S., Langmuir 9, 1232 (1993); Silberzan, P., Leger, L., Ausserre, D., and Benattar, J. J., Langmuir 7, 1647 (1991); Pomerantz, M., Segmuller, A., Netzer, L., and Sagiv, J., Thin Solid Films 132, 153 (1985); Margel, S., Sivan, O., and Dolitzky, Y., Langmuir 7, 2317 (1991); Le Grange, J. D., Markham, J. L., and Kurkjian, C. R., Langmuir 9, 1749 (1993); Ruhe, J., Novotny, V. J., Kanazawa, K. K., Clarke, T., and Street, G. B., Langmuir 9, 2383 (1993); Wasserman, S. R., Whitesides, G. M., Tidswell, I. M., Ocko, B. M., Pershan, P. S., and Axe, J. D., J. Am. Chem. Soc. 111, 5852 (1989); Nakagawa, T., Kazufumi, O., and Kurumizawa, T., Langmuir 10, 525 (1994).
12. Angst, D. L., and Simmons, G. W., Langmuir 7, 2236 (1991); De-Palma, V., and Tillman, N., Langmuir 5, 868 (1989); Wasserman, S. R., Tao, Y-T., and Whitesides, G. M., Langmuir 5, 1074 (1989); Maoz, R., and Sagiv, G., J. Colloid Interface Sci. 100, 465 (1984); Gun, J., Iscovici, R., and Sagiv, J., J. Colloid Interface Sci. 101, 201 (1984); Gun, J., and Sagiv, J., J. Colloid Interface Sci. 112, 457 (1986); Tillman, N., Ulman, A., and Penner, T. L., Langmuir 5, 101 (1989); Tillman, N., Ulman, A., Schildkraut, J. S., and Penner, T. L., J. Am. Chem. Soc. 110, 6136 (1988); Brandiss, S., and Margel, S., Langmuir 9, 1232 (1993); Silberzan, P., Leger, L., Ausserre, D., and Benattar, J. J., Langmuir 7, 1647 (1991); Pomerantz, M., Segmuller, A., Netzer, L., and Sagiv, J., Thin Solid Films 132, 153 (1985); Margel, S., Sivan, O., and Dolitzky, Y., Langmuir 7, 2317 (1991); Le Grange, J. D., Markham, J. L., and Kurkjian, C. R., Langmuir 9, 1749 (1993); Ruhe, J., Novotny, V. J., Kanazawa, K. K., Clarke, T., and Street, G. B., Langmuir 9, 2383 (1993); Wasserman, S. R., Whitesides, G. M., Tidswell, I. M., Ocko, B. M., Pershan, P. S., and Axe, J. D., J. Am. Chem. Soc. 111, 5852 (1989); Nakagawa, T., Kazufumi, O., and Kurumizawa, T., Langmuir 10, 525 (1994).
13. Angst, D. L., and Simmons, G. W., Langmuir 7, 2236 (1991); De-Palma, V., and Tillman, N., Langmuir 5, 868 (1989); Wasserman, S. R., Tao, Y-T., and Whitesides, G. M., Langmuir 5, 1074 (1989); Maoz, R., and Sagiv, G., J. Colloid Interface Sci. 100, 465 (1984); Gun, J., Iscovici, R., and Sagiv, J., J. Colloid Interface Sci. 101, 201 (1984); Gun, J., and Sagiv, J., J. Colloid Interface Sci. 112, 457 (1986); Tillman, N., Ulman, A., and Penner, T. L., Langmuir 5, 101 (1989); Tillman, N., Ulman, A., Schildkraut, J. S., and Penner, T. L., J. Am. Chem. Soc. 110, 6136 (1988); Brandiss, S., and Margel, S., Langmuir 9, 1232 (1993); Silberzan, P., Leger, L., Ausserre, D., and Benattar, J. J., Langmuir 7, 1647 (1991); Pomerantz, M., Segmuller, A., Netzer, L., and Sagiv, J., Thin Solid Films 132, 153 (1985); Margel, S., Sivan, O., and Dolitzky, Y., Langmuir 7, 2317 (1991); Le Grange, J. D., Markham, J. L., and Kurkjian, C. R., Langmuir 9, 1749 (1993); Ruhe, J., Novotny, V. J., Kanazawa, K. K., Clarke, T., and Street, G. B., Langmuir 9, 2383 (1993); Wasserman, S. R., Whitesides, G. M., Tidswell, I. M., Ocko, B. M., Pershan, P. S., and Axe, J. D., J. Am. Chem. Soc. 111, 5852 (1989); Nakagawa, T., Kazufumi, O., and Kurumizawa, T., Langmuir 10, 525 (1994).
14. Angst, D. L., and Simmons, G. W., Langmuir 7, 2236 (1991); De-Palma, V., and Tillman, N., Langmuir 5, 868 (1989); Wasserman, S. R., Tao, Y-T., and Whitesides, G. M., Langmuir 5, 1074 (1989); Maoz, R., and Sagiv, G., J. Colloid Interface Sci. 100, 465 (1984); Gun, J., Iscovici, R., and Sagiv, J., J. Colloid Interface Sci. 101, 201 (1984); Gun, J., and Sagiv, J., J. Colloid Interface Sci. 112, 457 (1986); Tillman, N., Ulman, A., and Penner, T. L., Langmuir 5, 101 (1989); Tillman, N., Ulman, A., Schildkraut, J. S., and Penner, T. L., J. Am. Chem. Soc. 110, 6136 (1988); Brandiss, S., and Margel, S., Langmuir 9, 1232 (1993); Silberzan, P., Leger, L., Ausserre, D., and Benattar, J. J., Langmuir 7, 1647 (1991); Pomerantz, M., Segmuller, A., Netzer, L., and Sagiv, J., Thin Solid Films 132, 153 (1985); Margel, S., Sivan, O., and Dolitzky, Y., Langmuir 7, 2317 (1991); Le Grange, J. D., Markham, J. L., and Kurkjian, C. R., Langmuir 9, 1749 (1993); Ruhe, J., Novotny, V. J., Kanazawa, K. K., Clarke, T., and Street, G. B., Langmuir 9, 2383 (1993); Wasserman, S. R., Whitesides, G. M., Tidswell, I. M., Ocko, B. M., Pershan, P. S., and Axe, J. D., J. Am. Chem. Soc. 111, 5852 (1989); Nakagawa, T., Kazufumi, O., and Kurumizawa, T., Langmuir 10, 525 (1994).
15. Angst, D. L., and Simmons, G. W., Langmuir 7, 2236 (1991); De-Palma, V., and Tillman, N., Langmuir 5, 868 (1989); Wasserman, S. R., Tao, Y-T., and Whitesides, G. M., Langmuir 5, 1074 (1989); Maoz, R., and Sagiv, G., J. Colloid Interface Sci. 100, 465 (1984); Gun, J., Iscovici, R., and Sagiv, J., J. Colloid Interface Sci. 101, 201 (1984); Gun, J., and Sagiv, J., J. Colloid Interface Sci. 112, 457 (1986); Tillman, N., Ulman, A., and Penner, T. L., Langmuir 5, 101 (1989); Tillman, N., Ulman, A., Schildkraut, J. S., and Penner, T. L., J. Am. Chem. Soc. 110, 6136 (1988); Brandiss, S., and Margel, S., Langmuir 9, 1232 (1993); Silberzan, P., Leger, L., Ausserre, D., and Benattar, J. J., Langmuir 7, 1647 (1991); Pomerantz, M., Segmuller, A., Netzer, L., and Sagiv, J., Thin Solid Films 132, 153 (1985); Margel, S., Sivan, O., and Dolitzky, Y., Langmuir 7, 2317 (1991); Le Grange, J. D., Markham, J. L., and Kurkjian, C. R., Langmuir 9, 1749 (1993); Ruhe, J., Novotny, V. J., Kanazawa, K. K., Clarke, T., and Street, G. B., Langmuir 9, 2383 (1993); Wasserman, S. R., Whitesides, G. M., Tidswell, I. M., Ocko, B. M., Pershan, P. S., and Axe, J. D., J. Am. Chem. Soc. 111, 5852 (1989); Nakagawa, T., Kazufumi, O., and Kurumizawa, T., Langmuir 10, 525 (1994).
16. Angst, D. L., and Simmons, G. W., Langmuir 7, 2236 (1991); De-Palma, V., and Tillman, N., Langmuir 5, 868 (1989); Wasserman, S. R., Tao, Y-T., and Whitesides, G. M., Langmuir 5, 1074 (1989); Maoz, R., and Sagiv, G., J. Colloid Interface Sci. 100, 465 (1984); Gun, J., Iscovici, R., and Sagiv, J., J. Colloid Interface Sci. 101, 201 (1984); Gun, J., and Sagiv, J., J. Colloid Interface Sci. 112, 457 (1986); Tillman, N., Ulman, A., and Penner, T. L., Langmuir 5, 101 (1989); Tillman, N., Ulman, A., Schildkraut, J. S., and Penner, T. L., J. Am. Chem. Soc. 110, 6136 (1988); Brandiss, S., and Margel, S., Langmuir 9, 1232 (1993); Silberzan, P., Leger, L., Ausserre, D., and Benattar, J. J., Langmuir 7, 1647 (1991); Pomerantz, M., Segmuller, A., Netzer, L., and Sagiv, J., Thin Solid Films 132, 153 (1985); Margel, S., Sivan, O., and Dolitzky, Y., Langmuir 7, 2317 (1991); Le Grange, J. D., Markham, J. L., and Kurkjian, C. R., Langmuir 9, 1749 (1993); Ruhe, J., Novotny, V. J., Kanazawa, K. K., Clarke, T., and Street, G. B., Langmuir 9, 2383 (1993); Wasserman, S. R., Whitesides, G. M., Tidswell, I. M., Ocko, B. M., Pershan, P. S., and Axe, J. D., J. Am. Chem. Soc. 111, 5852 (1989); Nakagawa, T., Kazufumi, O., and Kurumizawa, T., Langmuir 10, 525 (1994).
17. Angst, D. L., and Simmons, G. W., Langmuir 7, 2236 (1991); De-Palma, V., and Tillman, N., Langmuir 5, 868 (1989); Wasserman, S. R., Tao, Y-T., and Whitesides, G. M., Langmuir 5, 1074 (1989); Maoz, R., and Sagiv, G., J. Colloid Interface Sci. 100, 465 (1984); Gun, J., Iscovici, R., and Sagiv, J., J. Colloid Interface Sci. 101, 201 (1984); Gun, J., and Sagiv, J., J. Colloid Interface Sci. 112, 457 (1986); Tillman, N., Ulman, A., and Penner, T. L., Langmuir 5, 101 (1989); Tillman, N., Ulman, A., Schildkraut, J. S., and Penner, T. L., J. Am. Chem. Soc. 110, 6136 (1988); Brandiss, S., and Margel, S., Langmuir 9, 1232 (1993); Silberzan, P., Leger, L., Ausserre, D., and Benattar, J. J., Langmuir 7, 1647 (1991); Pomerantz, M., Segmuller, A., Netzer, L., and Sagiv, J., Thin Solid Films 132, 153 (1985); Margel, S., Sivan, O., and Dolitzky, Y., Langmuir 7, 2317 (1991); Le Grange, J. D., Markham, J. L., and Kurkjian, C. R., Langmuir 9, 1749 (1993); Ruhe, J., Novotny, V. J., Kanazawa, K. K., Clarke, T., and Street, G. B., Langmuir 9, 2383 (1993); Wasserman, S. R., Whitesides, G. M., Tidswell, I. M., Ocko, B. M., Pershan, P. S., and Axe, J. D., J. Am. Chem. Soc. 111, 5852 (1989); Nakagawa, T., Kazufumi, O., and Kurumizawa, T., Langmuir 10, 525 (1994).
18. Angst, D. L., and Simmons, G. W., Langmuir 7, 2236 (1991); De-Palma, V., and Tillman, N., Langmuir 5, 868 (1989); Wasserman, S. R., Tao, Y-T., and Whitesides, G. M., Langmuir 5, 1074 (1989); Maoz, R., and Sagiv, G., J. Colloid Interface Sci. 100, 465 (1984); Gun, J., Iscovici, R., and Sagiv, J., J. Colloid Interface Sci. 101, 201 (1984); Gun, J., and Sagiv, J., J. Colloid Interface Sci. 112, 457 (1986); Tillman, N., Ulman, A., and Penner, T. L., Langmuir 5, 101 (1989); Tillman, N., Ulman, A., Schildkraut, J. S., and Penner, T. L., J. Am. Chem. Soc. 110, 6136 (1988); Brandiss, S., and Margel, S., Langmuir 9, 1232 (1993); Silberzan, P., Leger, L., Ausserre, D., and Benattar, J. J., Langmuir 7, 1647 (1991); Pomerantz, M., Segmuller, A., Netzer, L., and Sagiv, J., Thin Solid Films 132, 153 (1985); Margel, S., Sivan, O., and Dolitzky, Y., Langmuir 7, 2317 (1991); Le Grange, J. D., Markham, J. L., and Kurkjian, C. R., Langmuir 9, 1749 (1993); Ruhe, J., Novotny, V. J., Kanazawa, K. K., Clarke, T., and Street, G. B., Langmuir 9, 2383 (1993); Wasserman, S. R., Whitesides, G. M., Tidswell, I. M., Ocko, B. M., Pershan, P. S., and Axe, J. D., J. Am. Chem. Soc. 111, 5852 (1989); Nakagawa, T., Kazufumi, O., and Kurumizawa, T., Langmuir 10, 525 (1994).
19. Angst, D. L., and Simmons, G. W., Langmuir 7, 2236 (1991); De-Palma, V., and Tillman, N., Langmuir 5, 868 (1989); Wasserman, S. R., Tao, Y-T., and Whitesides, G. M., Langmuir 5, 1074 (1989); Maoz, R., and Sagiv, G., J. Colloid Interface Sci. 100, 465 (1984); Gun, J., Iscovici, R., and Sagiv, J., J. Colloid Interface Sci. 101, 201 (1984); Gun, J., and Sagiv, J., J. Colloid Interface Sci. 112, 457 (1986); Tillman, N., Ulman, A., and Penner, T. L., Langmuir 5, 101 (1989); Tillman, N., Ulman, A., Schildkraut, J. S., and Penner, T. L., J. Am. Chem. Soc. 110, 6136 (1988); Brandiss, S., and Margel, S., Langmuir 9, 1232 (1993); Silberzan, P., Leger, L., Ausserre, D., and Benattar, J. J., Langmuir 7, 1647 (1991); Pomerantz, M., Segmuller, A., Netzer, L., and Sagiv, J., Thin Solid Films 132, 153 (1985); Margel, S., Sivan, O., and Dolitzky, Y., Langmuir 7, 2317 (1991); Le Grange, J. D., Markham, J. L., and Kurkjian, C. R., Langmuir 9, 1749 (1993); Ruhe, J., Novotny, V. J., Kanazawa, K. K., Clarke, T., and Street, G. B., Langmuir 9, 2383 (1993); Wasserman, S. R., Whitesides, G. M., Tidswell, I. M., Ocko, B. M., Pershan, P. S., and Axe, J. D., J. Am. Chem. Soc. 111, 5852 (1989); Nakagawa, T., Kazufumi, O., and Kurumizawa, T., Langmuir 10, 525 (1994).
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