Evaluation of ion-implanted-silicon detectors for use in intraoperative positron-sensitive probes

Medical Physics

Volumn 23, Issue 11, 1996, Pages 1889-1895

  Raylman, Raymond R ^a   Wahl, Richard L ^a  

^a UNIVERSITY OF MICHIGAN MEDICAL SCHOOL   (United States)

Author keywords

positron; probe; semiconductor; surgery

Indexed keywords

ELECTRONS; IMAGE RESOLUTION; IONS; PHOTODETECTORS; PHOTONS; POSITRONS; PROBES; SCINTILLATION COUNTERS; SEMICONDUCTOR MATERIALS; SURGERY; TRANSPLANTATION (SURGICAL); TUMORS;

ANNIHILATION PHOTONS; CONTINUING DEVELOPMENT; FLUORO 2 DEOXY D GLUCOSE; ION-IMPLANTED SILICON; OPERATING CHARACTERISTICS; PLASTIC SCINTILLATOR; POSITRON DETECTION; SPATIAL RESOLUTION;

SILICON DETECTORS;

FLUORODEOXYGLUCOSE F 18; ION; RADIOPHARMACEUTICAL AGENT; SILICON;

ARTICLE; CANCER SURGERY; DEVICE; INTRAOPERATIVE PERIOD; PHOTON; PRIORITY JOURNAL; RADIATION DETECTOR; SCINTILLATION; SEMICONDUCTOR; SURGICAL EQUIPMENT; TUMOR LOCALIZATION;

EID: 0029834829     PISSN: 00942405     EISSN: None     Source Type: Journal    
DOI: 10.1118/1.597751     Document Type: Article

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