Fading and broadening of electron diffraction spot from beam-damaged multiple monolayer films

Journal of Microscopy

Volumn 184, Issue 1, 1996, Pages 17-21

  Ohno, T ^a  

^a AICHI MEDICAL UNIVERSITY   (Japan)

Author keywords

Aliphatic carboxylic acid; Electron beam damage; Electron diffraction; Multiple monolayer films; Radiation damage

Indexed keywords

ELECTRON DIFFRACTION; ELECTRONS; MONOLAYERS; SATURATED FATTY ACIDS;

ALIPHATIC CARBOXYLIC ACIDS; BEHENIC ACIDS; DAMAGE MECHANISM; DIFFRACTION SPOTS; ELECTRON BEAM DAMAGE; MECHANISM-BASED; MONOLAYER FILM; MULTIPLE MONOLAYER FILM; MULTIPLE MONOLAYERS; SPECIMEN THICKNESS;

RADIATION DAMAGE;

BEHENIC ACID; CARBOXYLIC ACID;

ARTICLE; ELECTRON BEAM; ELECTRON DIFFRACTION; PRIORITY JOURNAL; RADIATION INJURY;

EID: 0029831542     PISSN: 00222720     EISSN: None     Source Type: Journal    
DOI: 10.1046/j.1365-2818.1996.1170674.x     Document Type: Article

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