Process characterization and properties of titanium nitride films prepared by the linear magnetron sputtering system

Vide: Science, Technique et Applications

Volumn , Issue , 1996, Pages 143-145

  Miernik, Krzysztof ^a   Walkowicz, Jan ^a   Smolik, Jerzy ^a  

^a NATIONAL RESEARCH INSTITUTE   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; ELECTRIC BREAKDOWN; ELECTRIC POWER SUPPLIES TO APPARATUS; MAGNETIC FIELDS; MAGNETRON SPUTTERING; MIXTURES; PHYSICAL PROPERTIES; PRESSURE; TITANIUM NITRIDE; VACUUM;

BREAKDOWN VOLTAGE; COATING PARAMETERS; MAGNETIC TRAP; TITANIUM NITRIDE FILMS;

THIN FILMS;

EID: 0029779511     PISSN: 12660167     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)