Thickness dependent phase formation in Fe thin film and Si substrate solid phase reaction

Materials Research Society Symposium - Proceedings

Volumn 402, Issue , 1996, Pages 337-342

  Molnar, Gy ^a   Peto, G ^a   Zsoldos, E ^a   Horvath, Z E ^a   Khanh, N Q ^a  

^a INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; IRON; NUCLEATION; OPTICAL MICROSCOPY; REACTION KINETICS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

IRON SILICIDE; PHASE FORMATION MODEL; SOLID PHASE REACTION;

CHEMICAL REACTIONS;

EID: 0029779235     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)