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Volumn 113, Issue , 1996, Pages 91-98

In-situ observation of the oxidation behaviour of a silicon nitride densified with the aid of Y2O3 and Al2O3 by hot-stage microscopy

Author keywords

Hot Stage Microscopy; In Situ Observation; Kinetics; Modelling; Oxidation; Silicon Nitride

Indexed keywords

ALUMINA; AMORPHOUS FILMS; DENSIFICATION; DIFFUSION; HIGH TEMPERATURE OPERATIONS; INTERFACES (MATERIALS); MICROSCOPIC EXAMINATION; OXYGEN; POROUS MATERIALS; REACTION KINETICS; THERMOOXIDATION; YTTRIUM COMPOUNDS;

EID: 0029777984     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: None     Document Type: Article
Times cited : (3)

References (3)
  • 1
    • 18844421075 scopus 로고
    • E. Bullock, R. Brunetand, J.F. Condé, S.R. Keown, S.F.Pugh (eds.), Elsevier Applied Science Publishers
    • F. Negrini, Research and Development of High Temperature Materials for Industry, E. Bullock, R. Brunetand, J.F. Condé, S.R. Keown, S.F.Pugh (eds.), Elsevier Applied Science Publishers, 369 (1989).
    • (1989) Research and Development of High Temperature Materials for Industry , pp. 369
    • Negrini, F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.