|
Volumn 113, Issue , 1996, Pages 91-98
|
In-situ observation of the oxidation behaviour of a silicon nitride densified with the aid of Y2O3 and Al2O3 by hot-stage microscopy
a,c a a b |
Author keywords
Hot Stage Microscopy; In Situ Observation; Kinetics; Modelling; Oxidation; Silicon Nitride
|
Indexed keywords
ALUMINA;
AMORPHOUS FILMS;
DENSIFICATION;
DIFFUSION;
HIGH TEMPERATURE OPERATIONS;
INTERFACES (MATERIALS);
MICROSCOPIC EXAMINATION;
OXYGEN;
POROUS MATERIALS;
REACTION KINETICS;
THERMOOXIDATION;
YTTRIUM COMPOUNDS;
HOT STAGE MICROSCOPY;
IN SITU OBSERVATION;
INTERGRANULAR PHASE;
ISOTHERMAL PROCESS;
PARABOLIC KINETICS;
TOPOGRAPHICAL CHANGES;
YTTRIA;
SILICON NITRIDE;
|
EID: 0029777984
PISSN: 10139826
EISSN: 16629795
Source Type: Book Series
DOI: None Document Type: Article |
Times cited : (3)
|
References (3)
|