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Volumn 143, Issue 1, 1996, Pages 264-271

Electron cyclotron resonance plasma etching of native TiO2 on TiN

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; ETCHING; GRAIN BOUNDARIES; ION BOMBARDMENT; OXYGEN; PLASMAS; SECONDARY ION MASS SPECTROMETRY; SURFACES; TITANIUM OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0029777784     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836419     Document Type: Article
Times cited : (5)

References (31)
  • 1
    • 0001629258 scopus 로고
    • and references cited therein
    • S. P. Murarka, J. Vac. Sci. Technol., B4, 1325 (1986), and references cited therein.
    • (1986) J. Vac. Sci. Technol. , vol.B4 , pp. 1325
    • Murarka, S.P.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.