Microstructure and properties of layered oxide thin films fabricated by MOCVD

Materials Research Society Symposium - Proceedings

Volumn 415, Issue , 1996, Pages 189-194

  Li, Tingkai ^a   Zhu, Yongfei ^a   Desu, Seshu B ^a   Nagata, Masaya ^a  

^a VIRGINIA POLYTECHNIC INSTITUTE AND STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; CRYSTALLINE MATERIALS; FERROELECTRIC MATERIALS; GRAIN SIZE AND SHAPE; LEAKAGE CURRENTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; OXIDE SUPERCONDUCTORS; PERMITTIVITY; SILICON WAFERS; SINGLE CRYSTALS; SUBSTRATES;

CURIE TEMPERATURE; DEPOSITION TEMPERATURE; DIRECT LIQUID INJECTION METALLORGANIC; FERROELECTRIC PROPERTIES; NONVOLATILE RANDOM ACCESS MEMORY APPLICATIONS; PHASE FORMATION;

THIN FILMS;

EID: 0029777759     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)