Current versus potential studies for copper electrodeposition at a rotating disc electrode

Transactions of the Institute of Metal Finishing

Volumn 74, Issue 1, 1996, Pages 39-43

  Man, E S ^a   Famdon, E E ^a   Campbell, S A ^a   Walsh, E C ^a  

^a UNIVERSITY OF PORTSMOUTH   (United Kingdom)

Author keywords

Convective diffusion; Copper electrodeposition; Current vs potential curves; Diffusion coefficient; Levich equation; Limiting current; Linear sweep voltammetry; Rotating disc electrode (rde)

Indexed keywords

CONCENTRATION (PROCESS); COPPER COMPOUNDS; DIFFUSION; ELECTRIC CURRENT MEASUREMENT; ELECTRODES; MASS TRANSFER; ROTATING DISKS; SODIUM COMPOUNDS; SOLUTIONS; VISCOSITY;

CATHODIC REACTION; COPPER DEPOSITION REACTION; KINEMATIC VISCOSITY; LEVICH EQUATION; LINEAR SWEEP VOLTAMMETRY; ROTATING DISK ELECTRODE;

ELECTRODEPOSITION;

EID: 0029775457     PISSN: 00202967     EISSN: None     Source Type: Journal    
DOI: 10.1080/00202967.1996.11871089     Document Type: Article

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