Large-field (> 20 × 25 mm2) replication by EUV lithography

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 179-182

  Haga, Tsuneyuki ^a   Tinone, Marcia C K ^a   Takenaka, Hisataka ^a   Kinoshita, Hiroo ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; LIGHT REFLECTION; LIGHTING; MASKS; MIRRORS; OPTICS;

EXTREME ULTRAVIOLET LITHOGRAPHY; ILLUMINATION OPTICS; MULTILAY REFLECTION OPTICS; REFLECTION MASK; SCHWARZSCHILD OPTICS; TRANSPARENCY MASK; X RAY PROJECTION LITHOGRAPHY;

X RAY LITHOGRAPHY;

EID: 0029775428     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00221-9     Document Type: Article

References (7)

1. H. Kinoshita, T. Kaneko, H. Takei, N. Takeuchi and S. Ishihara, in Conf. of Appl. Phys.(28p-zf-15, Jpn. Soc. Appl. Phys. 1986).
2. H. Kinoshita, K. Kurihara, Y. Ishii and Y. Torii, J. Vac. Sci. Technol. B 7 (1989) 1648-1651.
3. H. Kinoshita, K. Kurihara, T. Mizota, T. Haga and Y. Torii, OSA Proceedings on Soft X-ray Projection Lithography, Vol. 12 (1991) 11 .
4. T. E. Jewell, M. M. Becker, J. E. Bjorkholm, J. Boker, L. Eichner, R. R. Freeman, W. M. Mansfield, A. A. Macdowell, M. L. O'Malley, E. L. Raab, W. T. Silftvast, L. H. Szeto, D. M. Tennant, W. K. Waskieewicz, D. L. White, D. L. Windt, O. R. Wood II and J. H. Bruning, Proc. of the SPIE Symp. on Microlithography, San Jose (1990) 1263-1234.
5. H. Kinoshita, SPIE Vol. 1742 (1992) 576-584.
6. H. Kinoshita, K. Kurihara, T. Mizota, T. Haga, H. Takenaka and Y. Torii, Appl. Opt. Vol. 32, No. 34 (1993) 7079-7083.
7. H. Kinoshita, OSA Proceedings on Soft X-ray Projection Lithography, Vol 18 (1993) 74.