Surface damage effects on secondary electron emission from the negative electron affinity diamond surface

Materials Research Society Symposium - Proceedings

Volumn 416, Issue , 1996, Pages 311-316

  Malta, D P ^a   Posthill, J B ^a   Humphreys, T P ^a   Mantini, M J ^a   Markunas, R J ^a  

^a RTI INTERNATIONAL   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON EMISSION; GRAPHITIZATION; HYDROGEN; HYDROGENATION; ION IMPLANTATION; PHOTOELECTRON SPECTROSCOPY; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR PLASMAS; SURFACES; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET SPECTROSCOPY;

ELECTROCHEMICAL ETCHING; NEGATIVE ELECTRON AFFINITY; OXYGEN ARGON PLASMA ETCHING; SURFACE DAMAGE EFFECTS; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY;

SEMICONDUCTING DIAMONDS;

EID: 0029773509     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)